The thin film and semiconductor industry has experienced rapid growth in recent years. The increasing demand for LCD screens, fuel cells, optical devices, and semiconductors in various industries is driving the growth of thin film and semiconductors. These consumer goods and industrial applications benefit from the exceptional physical and chemical properties of complex oxide sputtering targets.
In this blog, explore how this material works and how it is transforming the world of electronics.
What is a Complex Oxide Sputtering Target?
A complex oxide sputtering target is a cutting-edge material widely used in the field of thin film deposition. It offers exceptional physical and chemical properties that make it highly suitable for various applications in end-use industries.
These target materials are used in a specialized segment within the materials science industry, focusing on the production and distribution of sputtering. According to Extrapolate, the complex oxide sputtering target market is speculated to be worth $6.7 billion by 2028, depicting a compound annual growth rate (CAGR) of 5.5% over 2022-2028. This number shows significant growth in this industry in the coming years.
How does Complex Oxide Sputtering Target Work?
Sputtering is a process where atoms or molecules are dislodged from a solid target material due to the bombardment of the target by energetic particles. In the case of complex oxide sputtering targets, the particles emitted from the target material undergo a chemical reaction, depositing a film with a different composition on a certain substrate. This process enables the smooth and efficient production of oxide films, which are widely used in various industries.
Four Main Types of Complex Oxide Sputtering Targets
Below are four key types of sputtering target materials depending on specific applications within the thin film deposition industry.
1. Microelectronic Target
This type of sputtering target is designed for applications in the microelectronics industry, where precise thin film deposition is crucial for the production of electronic components.
2. Magnetic Recording Target
These types of targets are utilized in the manufacturing of magnetic storage media, such as hard disk drives. In this type of disk drive, thin film deposition is essential for data storage and retrieval.
3. Optical Disk Target
This sputtering target is mainly used for the production of optical disks, contributing to the development of optical storage technologies. Various optical disk manufacturing companies rely on this target material for their production processes.
4. Tailored Types
There are other specialized types of complex oxide sputtering targets tailored for specific applications within the thin film deposition industry. Alloy sputtering targets, ceramic sputtering targets, and metal-boride sputtering targets are some examples of tailored sputtering target materials used in film deposition.
Major Benefits of Complex Oxide Sputtering Target
The sputtering targets offer several advantages, making them valuable in various applications. Some of the key advantages of these targets are listed below:
- Diverse Material Properties: Complex oxides can exhibit a wide range of material properties, including ferroelectric, magnetic, and piezoelectric characteristics which provide versatility in applications.
- Multifunctionality: Combining different metal oxides in a complex oxide target allows for multifunctional thin film deposition. Thus catering to various electronic, optical, and magnetic requirements.
- Tunability of Properties: The composition of sputtering targets can be altered to fine-tune material properties, which allows precise control in thin film deposition.
- Enhanced Performance: Complex oxide thin films are known for their superior performance in electronic devices, offering improved conductivity, dielectric constants, and magnetic properties.
- Integration in Electronics: These targets are used in the production of thin films for electronic devices such as integrated circuits, sensors, and memory devices.
- Superconductivity: Certain complex oxides exhibit superconducting properties, making them useful in the development of superconductors for various applications.
- Film Uniformity: Sputtering targets ensure uniform deposition of complex oxide thin films, resulting in consistent and high-quality coatings.
- Biocompatible Coatings: Some complex oxides exhibit biocompatible properties, making them suitable for applications in medical devices and implants.
- Resistance to Harsh Environments: Certain complex oxides offer stability and resilience in harsh environmental conditions, enhancing their suitability for specific applications.
- Energy Harvesting Devices: These targets are mainly used in the development of energy harvesting devices, leveraging their piezoelectric and ferroelectric properties.
Which are the Most Popular Complex Oxide Sputtering Target Materials?
The most popular complex oxide sputtering target materials in the industry are cerium oxide (CeO2) and copper sputtering targets. Cerium oxide sputtering targets are widely utilized in various applications, including the manufacturing of LCD screens and other electronic or high-tech industries.
The electronic industry heavily relies on cerium oxide sputtering targets for manufacturing consumer goods. Various companies, like SCI Engineered Materials, offer high-purity sputtering targets and thin-film deposition materials using various targets, including cerium dioxide sputtering targets. They are known for their high-quality laser ablation, cathodic arc sources, e-beam, MSVD, and PDL.
On the other hand, a copper sputtering target is utilized for coating reflective films, conductive films, and semiconductor films, making it an excellent choice for diverse thin film deposition applications.
Companies like Kurt J. Lesker Company are heavily involved in the vacuum industry, relying on copper material for backing plates bonded to sputtering targets. Copper, along with its compounds & alloys, evaporates under vacuum, forming layers in the manufacturing of semiconductors, sensors, and circuit devices.
Wrapping Up
A complex oxide sputtering target plays a pivotal role in the production of high-quality thin films for a diverse range of consumer goods and industrial applications. Its exceptional physical and chemical properties, coupled with the ability to offer deposition rate, homogeneity, and composition control, make it indispensable in the manufacturing of LCD screens, semiconductors, optical devices, microelectronics, and various optoelectronic devices.
As the global demand for electronic products continues to rise, the importance of these targets in thin film deposition processes increases. This shows an effective approach to environmental consciousness and customization options for various industries.
